SMI has recently released both vertical and horizontal nanowire and nanotube reactors. An example is a three zone heated tube furnace suitable for deposition of nanowires and nanotubes. The furnace offers operation to 1200C (extendable to 1500C). The 36" long tube allows deposition on multiple 4" wafers. Standard configurations include multiple gas sources and bubblers or flash evaporators for metal doping or seeding. Manual and automated versions are available for the researcher. System enhancements also include microwave or rf plasma process enhancement. These systems are also compatible with ALD growth approaches.   Link to the NanoCVD™ and NanoH CVD™ brochures here.
.