Structured Materials Industries, Inc. maintains engineering, demonstration and system assembly facilities at 201 Circle Drive North, Piscataway, New Jersey approximately 30 miles (or 45 minutes) from Newark International Airport (see map in "Contact SMI" ). SMI facilities are located centrally to several universities and analytical organizations for easy access and interaction.

The applications laboratory at SMI has:
• Cluster tool deposition system with 3-8” susceptors Spin CVD™ reactors
• Test 12” susceptor Spin CVD™
• Carbide/nitride SpinCVD™ reactors
• Static vertical and a static horizontal tube reactor
• CVDMicro™ reactor
• ZnO reactor(s)
• Tape CVD reactor and many others
• Sputter tool
• Evaporator

SMI also has the supporting process and analytic capabilities. SMIs experienced technical staff is readily available to resolve any deposition or equipment challenges.
Our staff approaches any development collaboration or process demonstration, as a proprietary and confidential effort, with a goal oriented attitude that places customer confidentiality and satisfaction as the primary objectives. We also use our facilities to stay at the forefront of CVD development performing needed research to advance a broad range of applications.

SMI’s R&D SpinCVD™ reactors offer 5” and 12” platters. These systems use gas, bubbler and vaporizer sources; focus on oxide materials, and are routinely used for customer development efforts.


SMI’s pilot cluster tool has three SpinCVD™ reactors (configured for 6”or 8” or multiple wafer operation) with space for an additional MOCVD reactor or etch/preclean module with multiple process capability. These systems use gas sources, conventional bubblers and Flash Evaporation Liquid Delivery Systems and are focused on oxide materials; but can be adapted to show other processes as needed.

SMI’s static and diffusion CVD tools are used for special batch or complex geometry coatings. These systems are also compatible or can be configured to be compatible with most precursor sources and may operate at low or atmospheric pressures.

SMI’s has internal capabilities for thin film characterization; including x-ray diffraction, Raman spectroscopy, visible-NIR spectroscopy, thin film reflectance spectroscopy, four point probe and Dektak thickness profilometer. Of particular relevance to this effort are our facilities for x-ray diffraction, optical spectroscopy and for thin film reflectance spectroscopy.
SMI's Application Laboratory Systems include
the following thin film deposition tools
SMI's Application Laboratory includes
the following analytic equipment
.